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Fabrication and optical characterization of titanium nitride (TiN) thin-films

Ashima Vashistha

Abstract

A study of structural and optical properties of titanium nitride films, deposited on Silicon and Quartz substrate is presented. The films were fabricated by the process of reactive magnetron sputtering with specific input parameters to test the dependence of thickness on these parameters. The analyses were made using spectroscopic ellipsometry. The results were utilized to analyse other optical properties by maintaining the same thickness for other samples fabricated on silicon and quartz substrates. Experiments were carried out to investigate the influence of input parameters on these optical properties of TiN films. The trends are presented using the Taguchi table. The paper suggests an assortment of supplied power, pressure and air flow to achieve a specific range of properties like thickness, refractive index, transmission or reflectance. Samples were fabricated to test the trends and fabricate films with desired optical properties using attuned input parameters. Graphs were prepared to confirm the achievement of results displaying the desired properties in conclusive sample which was fabricated using a set of parameters predicted to deliver such results.
Diploma type
Engineer's / Bachelor of Science
Diploma type
Engineer's thesis
Author
Ashima Vashistha (FM) Ashima Vashistha,, Faculty of Mechatronics (FM)
Title in Polish
Technologia i charakteryzacja optyczna cienkich warstw azotku tytanu (TiN)
Supervisor
Robert Paweł Mroczyński (FEIT/MO) Robert Paweł Mroczyński,, The Institute of Microelectronics and Optoelectronics (FEIT/MO)Faculty of Electronics and Information Technology (FEIT)
Certifying unit
Faculty of Mechatronics (FM)
Affiliation unit
Faculty of Mechatronics (FM)
Study subject / specialization
, Mechatronika
Language
(en) English
Status
Finished
Defense Date
08-05-2019
Issue date (year)
2019
Reviewers
Robert Paweł Mroczyński (FEIT/MO) Robert Paweł Mroczyński,, The Institute of Microelectronics and Optoelectronics (FEIT/MO)Faculty of Electronics and Information Technology (FEIT) Wojciech Krauze (FM/IMPh) Wojciech Krauze,, The Institute of Micromechanics and Photonics (FM/IMPh)Faculty of Mechatronics (FM)
Keywords in Polish
magnetron sputtering, ellipsometry, thin films, titanium nitride, transmission, reflectance, optical properties
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  • File: 1
    Thesis_Ashima_Vashistha._2019pdf.pdf
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Identyfikator pracy APD: 34097

Uniform Resource Identifier
https://repo.pw.edu.pl/info/bachelor/WUTadcda07d9f094f4898b4c959a7d68675/
URN
urn:pw-repo:WUTadcda07d9f094f4898b4c959a7d68675

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