Ultra-shallow ion implantation from r.f. plasma - the phenomenon and effect on electro-physical properties of MOS structures fabricated on Si and SiC substrates

Robert Paweł Mroczyński

Abstract

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Publication typeOriginal work published as abstract [Praca oryginalna opublikowana w streszczeniach ]
Author Robert Paweł Mroczyński IMiO
Robert Paweł Mroczyński,,
- The Institute of Microelectronics and Optoelectronics
Pages403-403
Publication size in sheets0.3
Book Mei Xiaodan (eds.): Conference Abstract Book BIT's 6th Annual World Congress of Nano Science and Technology-2016, 2016, BIT Group Global LTD., 584 p.
projectThe Development of Design, Processing and Testing Methods of the Electronic Devices and Materials for Microelectronics and Optoelectronics. Project leader: Szczepański Paweł, , Phone: (48 22) 234 58 70, start date 01-01-2015, planned end date 31-12-2015, end date 31-05-2016, IMiO/2015/STATUT/1, Implemented
WEiTI Działalność statutowa
Languageen angielski
Score (nominal)0
Citation count*0 (2018-06-16)
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