Ultra-shallow ion implantation from r.f. plasma - the phenomenon and effect on electro-physical properties of MOS structures fabricated on Si and SiC substrates
Robert Paweł Mroczyński
|Publication size in sheets||0.3|
|Book||Mei Xiaodan (eds.): Conference Abstract Book BIT's 6th Annual World Congress of Nano Science and Technology-2016, 2016, China, BIT Group Global LTD., 584 p.|
|Project||The Development of Design, Processing and Testing Methods of the Electronic Devices and Materials for Microelectronics and Optoelectronics. Project leader: Szczepański Paweł,
, Phone: (48 22) 234 58 70, start date 01-01-2015, planned end date 31-12-2015, end date 31-05-2016, IMiO/2015/STATUT/1, Implemented
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