Titanium(IV) isopropoxide as a source of titanium and oxygen atoms in carbon based coatings deposited by Radio Frequency Plasma Enhanced Chemical Vapour Deposition method

Anna Jędrzejczak , Damian Batory , Milena Prowizor , Magdalena Dominik , Mateusz Jakub Śmietana , Michał Cichomski , Aneta Kisielewska , Witold Szymański , Witold Kozlowski , Mariusz Dudek

Abstract

This paper presents properties of TiOx-DLC (titanium oxides incorporated diamond like carbon) coatings deposited by RF PECVD (Radio Frequency Plasma Enhanced Chemical Vapour Deposition) method using combination of methane (CH4) and titanium(IV) isopropoxide (Ti[OCH(CH3)2]4) atmospheres. The obtained results show that the deposition process of TiOx-DLC coatings is strongly affected by the concentration of TTIP (titanium (IV) isopropoxide) precursor in working atmosphere. The proposed technology allows to obtain TiOx-DLC coatings with Ti concentration up to 10 at.%. Higher concentrations of Ti in the coating (5 and 10 at.%) result in twice the concentration of oxygen. As the results of the investigation it was noticed, stable TiOx-DLC coatings showing acceptable hardness and residual stress, as well as good optical properties contain up to 1.5 at.% of Ti and can be deposited at 400 V of the negative self-bias using 0.05 of TTIP partial pressure ratio.
Author Anna Jędrzejczak - Politechnika Łódzka (PŁ)
Anna Jędrzejczak,,
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, Damian Batory - Politechnika Łódzka (PŁ)
Damian Batory,,
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, Milena Prowizor - Wydział Chemii [Uniwersytet Łódzki (UŁ)]
Milena Prowizor,,
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, Magdalena Dominik (FEIT / MO)
Magdalena Dominik,,
- The Institute of Microelectronics and Optoelectronics
, Mateusz Jakub Śmietana (FEIT / MO)
Mateusz Jakub Śmietana,,
- The Institute of Microelectronics and Optoelectronics
, Michał Cichomski - Wydział Chemii [Uniwersytet Łódzki (UŁ)]
Michał Cichomski,,
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, Aneta Kisielewska
Aneta Kisielewska,,
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, Witold Szymański - Politechnika Łódzka (PŁ)
Witold Szymański,,
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, Witold Kozlowski
Witold Kozlowski,,
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, Mariusz Dudek
Mariusz Dudek,,
-
Journal seriesThin Solid Films, ISSN 0040-6090
Issue year2020
Vol693
No1 January
Pages1-7
Publication size in sheets0.5
Article number137697
ASJC Classification2504 Electronic, Optical and Magnetic Materials; 2505 Materials Chemistry; 2506 Metals and Alloys; 2508 Surfaces, Coatings and Films; 3110 Surfaces and Interfaces
DOIDOI:10.1016/j.tsf.2019.137697
URL https://www.sciencedirect.com/science/article/pii/S0040609019307242
Languageen angielski
Score (nominal)70
Score sourcejournalList
ScoreMinisterial score = 70.0, 22-06-2020, ArticleFromJournal
Publication indicators WoS Citations = 0; Scopus Citations = 0; Scopus SNIP (Source Normalised Impact per Paper): 2017 = 0.864; WoS Impact Factor: 2018 = 1.888 (2) - 2018=1.748 (5)
Citation count*1 (2020-08-18)
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* presented citation count is obtained through Internet information analysis and it is close to the number calculated by the Publish or Perish system.
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