Properties of Chemical Vapor Deposition Graphene Transferred by High-Speed Electochemical Delamination

Tymoteusz Ciuk , Iwona Pasternak , Aleksandra Krajewska , Jan Sobieski , Piotr Caban , Jan Szmidt , Włodek Strupiński


We report on the electrical characterization and Raman spectroscopy of chemical vapor deposition coppergrown graphene transferred onto a Si/SiO2 substrate by highspeed (1 mm/s) electrochemical delamination. We determine graphene’s sheet resistance, carrier mobility, and concentration as well as its physical quality as a function of the electolyte concentration. Graphene’s electrical properties are investigated with standard Hall measurements in van der Pauw geometry and a contactless method that employs a single-post dielectric resonator operating at microwave frequencies. These properties are related to the widely used copper etching technique. The results prove that the high-speed electrochemical delamination provides good-quality graphene within a short time scale.
Author Tymoteusz Ciuk - [Institute of Electronic Materials Technology (ITME)]
Tymoteusz Ciuk,,
- Instytut Technologii Materiałów Elektronicznych
, Iwona Pasternak - Institute of Electronic Materials Technology (ITME) [Instytutu Technologii Materialow Elektronicznych w Warszawie]
Iwona Pasternak,,
, Aleksandra Krajewska - [Instytutu Technologii Materialow Elektronicznych w Warszawie]
Aleksandra Krajewska,,
, Jan Sobieski (FP / SRD)
Jan Sobieski,,
- Structural Research Division
, Piotr Caban - [Instytutu Technologii Materialow Elektronicznych w Warszawie]
Piotr Caban,,
, Jan Szmidt (FEIT / MO)
Jan Szmidt,,
- The Institute of Microelectronics and Optoelectronics
, Włodek Strupiński - [Instytutu Technologii Materialow Elektronicznych w Warszawie]
Włodek Strupiński,,
Journal seriesThe Journal of Physical Chemistry Part C: Nanomaterials, Interfaces and Hard Matter, ISSN 1932-7447
Issue year2013
Publication size in sheets0.5
ASJC Classification2508 Surfaces, Coatings and Films; 1606 Physical and Theoretical Chemistry; 2100 General Energy; 2504 Electronic, Optical and Magnetic Materials
Languageen angielski
Score (nominal)35
Score sourcejournalList
ScoreMinisterial score = 35.0, 27-05-2020, ArticleFromJournal
Ministerial score (2013-2016) = 35.0, 27-05-2020, ArticleFromJournal
Publication indicators WoS Citations = 47; Scopus Citations = 51; Scopus SNIP (Source Normalised Impact per Paper): 2013 = 1.432; WoS Impact Factor: 2013 = 4.835 (2) - 2013=5.241 (5)
Citation count*
Share Share

Get link to the record

* presented citation count is obtained through Internet information analysis and it is close to the number calculated by the Publish or Perish system.
Are you sure?