Facial landmarks localization using binary pattern analysis

Michał Ochocki , Dariusz Sawicki

Abstract

n/a
Author Michał Ochocki IETSIP
Michał Ochocki,,
- The Institute of the Theory of Electrical Engineering, Measurement and Information Systems
, Dariusz Sawicki IETSIP
Dariusz Sawicki,,
- The Institute of the Theory of Electrical Engineering, Measurement and Information Systems
Journal seriesPrzegląd Elektrotechniczny, ISSN 0033-2097
Issue year2016
Vol92
Pages43-46
DOIDOI:10.15199/48.2016.11.11
Languageen angielski
Score (nominal)14
ScoreMinisterial score = 14.0, 28-11-2017, ArticleFromJournal
Ministerial score (2013-2016) = 14.0, 28-11-2017, ArticleFromJournal
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