Towards high quality ITO coatings: The impact of nitrogen admixture in HiPIMS discharges

Vitezslav Stranak , Robert Bogdanowicz , Petr Sezemsky , Harm Wulff , Angela Kruth , Mateusz Jakub Śmietana , Jiri Kratochvil , Martin Cada , Zdenek Hubicka

Abstract

The paper reports controlled deposition of optically transparent and electrically conductive ITO films prepared by a combination of rf (13.56 MHz) and High Power Impulse Magnetron Sputtering (HiPIMS) systems without any post deposition thermal treatment/annealing. It is shown that (i) reactive admixture of N2 gas to the process and (ii) pressure in the deposition chamber enable to optimize optical properties of ITO films. Furthermore, the changes of electrical resistivity were observed, too. The variation of these ITO properties is attributed to change of crystalline structure measured by XRD methods.
Author Vitezslav Stranak
Vitezslav Stranak,,
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, Robert Bogdanowicz
Robert Bogdanowicz,,
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, Petr Sezemsky
Petr Sezemsky,,
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, Harm Wulff
Harm Wulff,,
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, Angela Kruth
Angela Kruth,,
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, Mateusz Jakub Śmietana (FEIT / MO)
Mateusz Jakub Śmietana,,
- The Institute of Microelectronics and Optoelectronics
, Jiri Kratochvil
Jiri Kratochvil,,
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, Martin Cada
Martin Cada,,
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, Zdenek Hubicka
Zdenek Hubicka,,
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Journal seriesSurface and Coatings Technology, ISSN 0257-8972, (A 35 pkt)
Issue year2018
Vol335
No15 February 2018
Pages126-133
Publication size in sheets0.5
Keywords in EnglishITO; HiPIMS; Plasma deposition; Film properties
DOIDOI:10.1016/j.surfcoat.2017.12.030
URL https://www.sciencedirect.com/science/article/pii/S0257897217312537
projectx. Project leader: Śmietana Mateusz Jakub, , Phone: (22) 234 63 64, start date 20-05-2015, planned end date 19-05-2019, IMiO/2015/NCN/2, Implemented
WEiTI Projects financed by NSC [Projekty finansowane przez NCN]
Languageen angielski
Score (nominal)35
ScoreMinisterial score = 35.0, 25-01-2018, ArticleFromJournal
Ministerial score (2013-2016) = 35.0, 25-01-2018, ArticleFromJournal
Publication indicators WoS Impact Factor: 2016 = 2.589 (2) - 2016=2.538 (5)
Citation count*2 (2018-11-18)
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* presented citation count is obtained through Internet information analysis and it is close to the number calculated by the Publish or Perish system.
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