Towards high quality ITO coatings: The impact of nitrogen admixture in HiPIMS discharges
Vitezslav Stranak , Robert Bogdanowicz , Petr Sezemsky , Harm Wulﬀ , Angela Kruth , Mateusz Jakub Śmietana , Jiri Kratochvil , Martin Cada , Zdenek Hubicka
AbstractThe paper reports controlled deposition of optically transparent and electrically conductive ITO films prepared by a combination of rf (13.56 MHz) and High Power Impulse Magnetron Sputtering (HiPIMS) systems without any post deposition thermal treatment/annealing. It is shown that (i) reactive admixture of N2 gas to the process and (ii) pressure in the deposition chamber enable to optimize optical properties of ITO films. Furthermore, the changes of electrical resistivity were observed, too. The variation of these ITO properties is attributed to change of crystalline structure measured by XRD methods.
|Journal series||Surface and Coatings Technology, ISSN 0257-8972|
|No||15 February 2018|
|Publication size in sheets||0.5|
|Keywords in English||ITO; HiPIMS; Plasma deposition; Film properties|
|project||x. Project leader: Śmietana Mateusz Jakub,
, Phone: (22) 234 63 64, start date 20-05-2015, planned end date 19-05-2019, IMiO/2015/NCN/2, Implemented
|Score|| = 35.0, 25-01-2018, ArticleFromJournal|
= 35.0, 25-01-2018, ArticleFromJournal
|Publication indicators||: 2016 = 2.589 (2) - 2016=2.538 (5)|
* presented citation count is obtained through Internet information analysis and it is close to the number calculated by the Publish or Perish system.