Comparison of the structural and corrosion properties of the graphene/SiN(200) coating system deposited on titanium alloy surfaces covered with SiN transition layers

Małgorzata Kalisz , M. Grobelny , Michał Świniarski , Piotr Firek


In this paper, comparative studies of the structural and corrosion properties of SiN/graphene/SiN coating systems with various SiN transition layer thickness have been investigated. The coating systems were formed on Ti6Al4V alloy surfaces. The SiN transition layer thicknesses varied from 100 nm to 300 nm. The thickness of the upper silicon nitride thin film, in all examined cases, was 200 nm. The silicon nitride thin film was deposited using the Plasma Enhanced Chemical Vapour Deposition method. A graphene monolayer was transferred onto the silicon nitride surface using the “PMMA-mediated” method. The structural characteristics of coating systems obtained were examined using Raman spectroscopy, optical profilometry and SEM measurements. The corrosion properties of the coating systems were determined by an analysis of the voltammetric curves. The SiN/graphene/SiN coating system with a 300 nm thick silicon nitride transition layer is characterised by the best structural and corrosion properties of all tested coating systems. In this case, the surface of the top silicon nitride thin film has no holes or flakes, as opposed to the coating systems with 100 nm and 200 nm thick transition layers, in which the upper SiN thin film flaked and dropped off. The value of corrosion current density obtained for this sample was almost two orders of magnitude lower than the current density obtained for the other tested coating systems.
Author Małgorzata Kalisz - Instytut Transportu Samochodowego
Małgorzata Kalisz,,
, M. Grobelny
M. Grobelny,,
, Michał Świniarski ZBS
Michał Świniarski,,
- Structural Research Division
, Piotr Firek IMiO
Piotr Firek,,
- The Institute of Microelectronics and Optoelectronics
Journal seriesSurface and Coatings Technology, ISSN 0257-8972
Issue year2016
Publication size in sheets0.5
Keywords in EnglishSilicon nitride thin film; Nanoindentation; Electrochemical properties; Graphene; Graphene hybrid system
projectxxx. Project leader: Szmidt Jan, , Phone: (48 22) 234 75 99; 234 77 76, start date 05-02-2013, planned end date 04-02-2016, GRAF-TECH/NCBR/14/26/2013, Implemented
WEiTI Projects financed by NCRD [Projekty finansowane przez NCBiR (NCBR)]
Languageen angielski
Score (nominal)35
ScoreMinisterial score = 35.0, 28-11-2017, ArticleFromJournal
Ministerial score (2013-2016) = 35.0, 28-11-2017, ArticleFromJournal
Publication indicators WoS Impact Factor: 2016 = 2.589 (2) - 2016=2.538 (5)
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