Plasma deposition of antimicrobial coating on organic polymer

Zenobia Rżanek-Boroch , Paulina Dziadczyk , Danuta Czajkowska , Krzysztof Krawczyk , Wojciech Fabianowski


Organic materials used for packing food products prevent the access of microorganisms or gases, like oxygen or water vapor. To prolong the stability of products, preservatives such as sulfur dioxide, sulfites, benzoates, nitrites and many other chemical compounds are used. To eliminate or limit the amount of preservatives added to food, so-called active packaging is sought for, which would limit the development of microorganisms. Such packaging can be achieved, among others, by plasma modification of a material to deposit on its surface substances inhibiting the growth of bacteria. In this work plasma modification was carried out in barrier discharge under atmospheric pressure. Sulfur dioxide or/and sodium oxide were used as the coating precursors. As a result of bacteriological studies it was found that sulfur containing coatings show a 16% inhibition of Salmonella bacteria growth and 8% inhibition of Staphylococcus aureus bacteria growth. Sodium containing coatings show worse (by 10%) inhibiting properties. Moreover, films with plasma deposited coatings show good sealing properties against water vapor.
Author Zenobia Rżanek-Boroch (FC / DITC)
Zenobia Rżanek-Boroch,,
- Department Of Inorganic Technology And Ceramics
, Paulina Dziadczyk (FC / CChT)
Paulina Dziadczyk,,
- Chair of Chemical Technology
, Danuta Czajkowska (FC / IBC / DDTB)
Danuta Czajkowska,,
- Department Of Drug Technology And Biotechnology
, Krzysztof Krawczyk (FC / DITC)
Krzysztof Krawczyk,,
- Department Of Inorganic Technology And Ceramics
, Wojciech Fabianowski (FC / CPCT)
Wojciech Fabianowski,,
- Chair Of Polymer Chemistry And Technology
Journal seriesEuropean Physical Journal-Applied Physics, ISSN 1286-0042
Issue year2013
Publication size in sheets0.3
ASJC Classification3104 Condensed Matter Physics; 3105 Instrumentation; 2504 Electronic, Optical and Magnetic Materials
Languageen angielski
Eur. Phys. J. Appl. Phys. 610 (2013) 24316.pdf 487.75 KB
Score (nominal)20
Score sourcejournalList
ScoreMinisterial score = 20.0, 02-05-2020, ArticleFromJournal
Ministerial score (2013-2016) = 20.0, 02-05-2020, ArticleFromJournal
Publication indicators Scopus Citations = 2; WoS Citations = 1; GS Citations = 3.0; Scopus SNIP (Source Normalised Impact per Paper): 2013 = 0.52; WoS Impact Factor: 2013 = 0.789 (2) - 2013=0.801 (5)
Citation count*3 (2015-05-23)
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* presented citation count is obtained through Internet information analysis and it is close to the number calculated by the Publish or Perish system.
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