Investigation of metal distribution and carbide crystallite formation in metal-doped carbon films (a-C:Me, Me = Ti, V, Zr, W) with low metal content
C. Adelhelm , M. Balden , Marcin Rasiński , S. Lindig , Tomasz Płociński , E. Welter , M. Sikora
AbstractMetal-doped amorphous carbon films (a-C:Me) were deposited at room temperature by magnetron sputtering using a metal (Me = Ti, V, Zr, W) and a graphite target. The metal distribution and the temperature-induced carbide crystallite formation were analyzed by X-ray diffraction (XRD), electron microscopy (TEM, STEM) and X-ray absorption spectroscopy (EXAFS, XANES), focusing on low metal concentrations between 6.5 and 9.5%. In as-deposited samples, the metal atoms are atomically distributed in the carbon matrix without significant formation of carbide particles. With annealing to 900K the local atomic environment around the metal atoms becomes similar to the carbide. The carbide crystallites grow with annealing up to 1300K, their size is dependent on the metal type: V > Ti > Zr≈W. W2C and WC1-x crystallites were identified for W-doped films, whereas the monocarbides are formed for the other metals. It is demonstrated, that EXAFS and high resolution electron microscopy are required to get a correct picture of the structure of the analyzed a-C:W films. © 2011.
|Journal series||Surface and Coatings Technology, ISSN 0257-8972, (A 40 pkt)|
|Pages||4335 - 4342|
|Publication size in sheets||0.5|
|Keywords in English||Amorphous carbon; Carbide; EXAFS; TEM; XRD|
|ASJC Classification||; ; ; ;|
|Publication indicators||= 8; = 9; : 2014 = 1.681; : 2011 = 1.867 (2) - 2011=2.193 (5)|
|Citation count*||14 (2020-01-31)|
* presented citation count is obtained through Internet information analysis and it is close to the number calculated by the Publish or Perish system.