A novel fast and flexible technique of radical kinetic behaviour investigation based on pallet for plasma evaluation structure and numerical analysis

Arkadiusz Malinowski , Takuya Takeuchi , Shang Chen , Toshiya Suzuki , Kenji Ishikawa , Makoto Sekine , Masari Hori , Lidia Łukasiak , Andrzej Jakubowski

Abstract

This paper describes a new, fast, and case-independent technique for sticking coefficient (SC) estimation based on pallet for plasma evaluation (PAPE) structure and numerical analysis. Our approach does not require complicated structure, apparatus, or time-consuming measurements but offers high reliability of data and high flexibility. Thermal analysis is also possible. This technique has been successfully applied to estimation of very low value of SC of hydrogen radicals on chemically amplified ArF 193 nm photoresist (the main goal of this study). Upper bound of our technique has been determined by investigation of SC of fluorine radical on polysilicon (in elevated temperature). Sources of estimation error and ways of its reduction have been also discussed. Results of this study give an insight into the process kinetics, and not only they are helpful in better process understanding but additionally they may serve as parameters in a phenomenological model development for predictive modelling of etching for ultimate CMOS topography simulation.
Author Arkadiusz Malinowski (FEIT / MO)
Arkadiusz Malinowski,,
- The Institute of Microelectronics and Optoelectronics
, Takuya Takeuchi - [Nagoya University]
Takuya Takeuchi,,
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, Shang Chen - [Nagoya University]
Shang Chen,,
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, Toshiya Suzuki - [Nagoya University]
Toshiya Suzuki,,
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, Kenji Ishikawa - [Nagoya University]
Kenji Ishikawa,,
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, Makoto Sekine - [Nagoya University]
Makoto Sekine,,
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, Masari Hori - [Nagoya University]
Masari Hori,,
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, Lidia Łukasiak (FEIT / MO)
Lidia Łukasiak,,
- The Institute of Microelectronics and Optoelectronics
, Andrzej Jakubowski (FEIT / MO)
Andrzej Jakubowski,,
- The Institute of Microelectronics and Optoelectronics
Journal seriesJournal of Physics B-Atomic Molecular and Optical Physics, ISSN 0953-4075
Issue year2013
Vol46
No265201
Pages1-11
ASJC Classification3104 Condensed Matter Physics; 3107 Atomic and Molecular Physics, and Optics
DOIDOI:10.1088/0022-3727/46/26/265201
URL http://iopscience.iop.org/0022-3727/46/26/265201
Languagepl polski
Score (nominal)30
Score sourcejournalList
ScoreMinisterial score = 30.0, 01-02-2020, ArticleFromJournal
Ministerial score (2013-2016) = 30.0, 01-02-2020, ArticleFromJournal
Publication indicators WoS Citations = 0; Scopus Citations = 1; Scopus SNIP (Source Normalised Impact per Paper): 2013 = 0.983; WoS Impact Factor: 2013 = 1.916 (2) - 2013=1.696 (5)
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