Ultra-shallow fluorine and nitrogen implantation from r.f. plasma and its effect on electro-physical parameters of Al/HfO2/Si MOS structures

Małgorzata Kalisz , Robert Paweł Mroczyński , M. Szymańska

Abstract

This study described a novel and original method of ultra-shallow fluorine and nitrogen implantation from radio frequency (RF = 13,56MHz) CF4 and NH3 plasmas, performed in classical RIE / PECVD reactors. The performed experiments indicate that ultra-shallow implantation of high concentration of fluorine and nitrogen ions by using r.f. plasma reactors (PECVD ad RIE) is feasible. It is also possible to control the implantation process parameters, ie implantation depth and maximum concentration, by controlling the parameters of the plasma processes. Electrical characterization of MOS structures with HfO2 layer as a gate dielectric, shows that samples implanted with nitrogen, have the best insulating properties, better even the reference sample. Samples prepared by fluorine implantation, exhibit much worse I-V behavior for low, medium and high electric fields, than all samples studied in this article. This samples exhibit the highest leakage currents, too.
Author Małgorzata Kalisz - Instytut Transportu Samochodowego [Warsaw University of Technology (PW)]
Małgorzata Kalisz,,
-
- Politechnika Warszawska
, Robert Paweł Mroczyński (FEIT / MO)
Robert Paweł Mroczyński,,
- The Institute of Microelectronics and Optoelectronics
, M. Szymańska - [Politechnika Warszawska]
M. Szymańska,,
-
-
Pages1-7
Book Szczepański Paweł, Kisiel Ryszard, Romaniuk Ryszard (eds.): Proceedings of SPIE Electron Technology Conference 2013, vol. 1, no. 8902, 2013, P.O.Box 10, Bellingham, Washington 98227-0010 USA, SPIE, ISBN 9780819495211, 752 p., DOI:10.1117/12.2033297
Keywords in EnglishPECVD implantation, RIE implantation, C-V characterization, SIMS characterization, high-k dielectrics
DOIDOI:10.1117/12.2030304
URL http://spie.org/x648.xml?product_id=2030304
Languageen angielski
File
Ultra-shallow fluorine and nitrogen implantation from r.f. plasma and.pdf 1,003.3 KB
Score (nominal)15
Score sourceconferenceIndex
ScoreMinisterial score = 10.0, 24-01-2020, BookChapterMatConfByIndicator
Ministerial score (2013-2016) = 15.0, 24-01-2020, BookChapterMatConfByIndicator
Publication indicators Scopus Citations = 0; WoS Citations = 1
Citation count*
Cite
Share Share

Get link to the record


* presented citation count is obtained through Internet information analysis and it is close to the number calculated by the Publish or Perish system.
Back
Confirmation
Are you sure?