Carbide formation in tungsten-containing amorphous carbon films by annealing

M. Balden , P. A. Sauter , S. Jong , C. Adelhelm , S. Lindig , Marcin Rasiński , Tomasz Płociński


Tungsten-containing amorphous carbon films were produced by dual magnetron sputter deposition. The formation of carbide phases after heat treatment in inert gas at temperatures up to 2800 K was investigated by X-ray diffraction for tungsten concentrations below 25 at.%. After deposition, each film consists of an amorphous carbon matrix with atomically dispersed W inclusions. Annealing up to 2800 K leads to a formation of carbide phases and to nano clustering. Three tungsten carbide phases were observed (WC, W2C, and WC 1 - x), mostly as mixtures of two phases. The phase combination depends on annealing temperature and W concentration. Additionally, nano diffraction was performed in a scanning transmission electron microscope, to determine the phase of single crystallites at scales, where X-ray diffraction fails. © 2011 Elsevier B.V. All rights reserved.
Author M. Balden
M. Balden,,
, P. A. Sauter
P. A. Sauter,,
, S. Jong
S. Jong,,
, C. Adelhelm
C. Adelhelm,,
, S. Lindig
S. Lindig,,
, Marcin Rasiński ZPM
Marcin Rasiński,,
- Division of Materials Design
, Tomasz Płociński ZPM
Tomasz Płociński,,
- Division of Materials Design
Journal seriesThin Solid Films, ISSN 0040-6090
Issue year2011
Pages4049 - 4053
Publication size in sheets0.5
Keywords in EnglishCarbon-based amorphous films; Chemical reactions; Plasma-materials interaction
Languageen angielski
Carbide-formation-in-tungsten-containing-amorphous-carbon-_2011_Thin-Solid-F.pdf 1.08 MB
Score (nominal)30
Publication indicators WoS Impact Factor: 2011 = 1.89 (2) - 2011=2.014 (5)
Citation count*8 (2018-06-17)
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