Effects of deep-level dopants on the electronic potential of thin Si pn junctions observed by Kelvin probe force microscope

Roland Nowak , Daniel Moraru , Takeshi Mizuno , Ryszard Jabłoński , Michiharu Tabe

Abstract

Electronic potential measurements performed by low-temperature Kelvin probe force microscopy on silicon-on-insulator lateral nanoscale pn junctions are presented. The electronic potential landscape contains a region of enhanced potential induced by interdiffused dopants with deeper ground-state levels compared to bulk. The discrete dopant distribution can be observed in specific line profiles. In most line profiles, time-dependent potential fluctuations due to charging and discharging of dopants give rise to a localized-noise area corresponding to the depletion region.
Author Roland Nowak (FM / IMBE) - [Universytet Shizuoka, Japonia]
Roland Nowak,,
- The Institute of Metrology and Biomedical Engineering
- Universytet Shizuoka, Japonia
, Daniel Moraru - [National University Corporation Shizuoka University]
Daniel Moraru,,
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, Takeshi Mizuno - [National University Corporation Shizuoka University]
Takeshi Mizuno,,
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, Ryszard Jabłoński (FM / IMBE)
Ryszard Jabłoński,,
- The Institute of Metrology and Biomedical Engineering
, Michiharu Tabe - [National University Corporation Shizuoka University]
Michiharu Tabe,,
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Journal seriesApplied Physics Letters, ISSN 0003-6951
Issue year2013
Vol102
No8
Pages083109-1 - 083109-4
Publication size in sheets0.5
ASJC Classification3101 Physics and Astronomy (miscellaneous)
DOIDOI:10.1063/1.4794406
Languageen angielski
Score (nominal)40
Score sourcejournalList
ScoreMinisterial score = 40.0, 17-09-2020, ArticleFromJournal
Ministerial score (2013-2016) = 40.0, 17-09-2020, ArticleFromJournal
Publication indicators WoS Citations = 16; Scopus Citations = 18; Scopus SNIP (Source Normalised Impact per Paper): 2013 = 1.634; WoS Impact Factor: 2013 = 3.515 (2) - 2013=3.739 (5)
Citation count*19 (2016-01-06)
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* presented citation count is obtained through Internet information analysis and it is close to the number calculated by the Publish or Perish system.
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