Numerical simulation of chemical vapour deposition process in electric field
AbstractThe deposition of thin solid films in CVD processes is determined by hydrodynamics, the chemical kinetics of the process and transport phenomena (heat transfer, species diffusion) in the reactor. The electric field must also be taken into account in simulation of some type CVD reactors (PECVD and RPCVD reactors). The paper deals with the modelling of CVD process in electric field. The purpose of this study was to estimate influence of electric field on deposition rate.
|Journal series||COMPUTERS & CHEMICAL ENGINEERING, ISSN 0098-1354|
|Publication size in sheets||0.5|
|Conference||European Symposium on Computer Aided Process Engineering - 8 (ESCAPE 8), 24-05-1998 - 27-05-1998, Brugge, Belgia|
|Keywords in English||chemical vapour deposition, computational fluid dynamics, electric field|
|Publication indicators||: 2006 = 1.404 (2) - 2007=1.815 (5)|
|Citation count*||10 (2015-03-24)|
* presented citation count is obtained through Internet information analysis and it is close to the number calculated by the Publish or Perish system.