Numerical simulation of chemical vapour deposition process in electric field

Leszek Rudniak

Abstract

The deposition of thin solid films in CVD processes is determined by hydrodynamics, the chemical kinetics of the process and transport phenomena (heat transfer, species diffusion) in the reactor. The electric field must also be taken into account in simulation of some type CVD reactors (PECVD and RPCVD reactors). The paper deals with the modelling of CVD process in electric field. The purpose of this study was to estimate influence of electric field on deposition rate.
Author Leszek Rudniak ZKTP
Leszek Rudniak,,
- Department of Process Kinetics and Thermodynamics
Journal seriesCOMPUTERS & CHEMICAL ENGINEERING, ISSN 0098-1354
Issue year1998
Vol22
NoSupplement 1
Pages755-758
Publication size in sheets0.5
ConferenceEuropean Symposium on Computer Aided Process Engineering - 8 (ESCAPE 8), 24-05-1998 - 27-05-1998, Brugge, Belgia
Keywords in Englishchemical vapour deposition, computational fluid dynamics, electric field
DOIDOI:10.1016/S0098-1354(98)00141-0
URL http://ac.els-cdn.com/S0098135498001410/1-s2.0-S0098135498001410-main.pdf?_tid=ae12c530-df04-11e6-bf38-00000aab0f6b&acdnat=1484912367_051e2e8cde7e2c4e6244d28604f96106
Languageen angielski
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Rudniak L. - Numerical simulation of chemical....pdf 294.08 KB
Score (nominal)35
Publication indicators WoS Impact Factor: 2006 = 1.404 (2) - 2007=1.815 (5)
Citation count*10 (2015-03-24)
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