Stress control for process optimization of the capacitive pressure sensors for biomedical applications achieved by surface micromachining technology
F. Gaiseanu , C. Postolache , D. Dascalu , J. Esteve , D. Tsoukalas , Ryszard Jachowicz , A. Badoiu , E. Vasile
AbstractAn integrated structure of capacitive pressure sensor for biomedical applications achieved by surface micromachining technology, consisting in the pressure sensor and a testing component is presented. The test structure permitted to apply the pull-in voltage method for the evaluation of the residual stress in the polysilicon layer on the basis of a new form of the set of two equations describing the beam pull-in voltage effect. The integrated structure allowed the optimization of the phosphorus diffusion process to obtain low stress polysilicon membranes of the capacitive pressure sensors for biomedical applications
|Book||Semiconductor Conference, 1998. CAS '98 Proceedings. 1998 International, vol. 1, 1998|
|Keywords in English||biomedical application, biomembranes, Biosensors, capacitive pressure sensor, capacitive sensors, Diffusion processes, Equations, integrated structure, internal stresses, micromachining, microsensors, phosphorus diffusion, polysilicon membrane, pressure sensors, process optimization, pull-in voltage, residual stress control, Residual Stresses, Si:P, Stress control, surface micromachining technology, Testing, Voltage|
|Citation count*||1 (2015-04-24)|
* presented citation count is obtained through Internet information analysis and it is close to the number calculated by the Publish or Perish system.