Characterization of ion/electron beam induced deposition of electrical contacts at the sub-μm scale
D Brunel , D. Troadec , D. Hourlier , D. Deresmes , Mariusz Zdrojek , T. Mélin
AbstractWe investigate the fabrication of electrical contacts using ion- and electron-beam induced deposition of platinum at the sub-μm scale. Halos associated with the metal surface decoration are characterized electrically in the 0.05–2 μm range using transport measurements, conducting atomic force microscopy and Kelvin probe microscopy. In contrast with IBID, EBID electrodes are shown to exhibit a low leakage resistance (above 1 MΩ) at the sub-100 nm scale, and are thus suitable to achieve resist-free electrical contacts for transport measurements on nanostructures. Four-point transport data using μm-spaced EBID contacts are provided for a multiwalled carbon nanotube.
|Journal series||Microelectronic Engineering, ISSN 0167-9317|
|Keywords in English||carbon nanotube, Electron beam induced deposition, FIB, Four probe measurements, Ion beam induced deposition, Transport measurements|
|Publication indicators||: 2011 = 1.557 (2) - 2011=1.495 (5)|
|Citation count*||4 (2015-06-01)|
* presented citation count is obtained through Internet information analysis and it is close to the number calculated by the Publish or Perish system.