Characterization of ion/electron beam induced deposition of electrical contacts at the sub-μm scale

D Brunel , D. Troadec , D. Hourlier , D. Deresmes , Mariusz Zdrojek , T. Mélin

Abstract

We investigate the fabrication of electrical contacts using ion- and electron-beam induced deposition of platinum at the sub-μm scale. Halos associated with the metal surface decoration are characterized electrically in the 0.05–2 μm range using transport measurements, conducting atomic force microscopy and Kelvin probe microscopy. In contrast with IBID, EBID electrodes are shown to exhibit a low leakage resistance (above 1 MΩ) at the sub-100 nm scale, and are thus suitable to achieve resist-free electrical contacts for transport measurements on nanostructures. Four-point transport data using μm-spaced EBID contacts are provided for a multiwalled carbon nanotube.
Author D Brunel - [IEMN Institut d'Electronique de Microelectronique et de Nanotechnologie]
D Brunel,,
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, D. Troadec - [IEMN Institut d'Electronique de Microelectronique et de Nanotechnologie]
D. Troadec,,
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, D. Hourlier - [IEMN Institut d'Electronique de Microelectronique et de Nanotechnologie]
D. Hourlier,,
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, D. Deresmes - [IEMN Institut d'Electronique de Microelectronique et de Nanotechnologie]
D. Deresmes,,
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, Mariusz Zdrojek (FP / SRD)
Mariusz Zdrojek,,
- Structural Research Division
, T. Mélin - [IEMN Institut d'Electronique de Microelectronique et de Nanotechnologie]
T. Mélin,,
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Journal seriesMicroelectronic Engineering, ISSN 0167-9317, (A 25 pkt)
Issue year2011
Vol88
No7
Pages1569-1572
Keywords in Englishcarbon nanotube, Electron beam induced deposition, FIB, Four probe measurements, Ion beam induced deposition, Transport measurements
ASJC Classification2208 Electrical and Electronic Engineering; 2508 Surfaces, Coatings and Films; 3104 Condensed Matter Physics; 3107 Atomic and Molecular Physics, and Optics; 2504 Electronic, Optical and Magnetic Materials
DOIDOI:10.1016/j.mee.2011.03.011
URL http://www.sciencedirect.com/science/article/pii/S0167931711002693
Score (nominal)25
Score sourcejournalList
Publication indicators Scopus Citations = 10; WoS Citations = 10; GS Citations = 16.0; Scopus SNIP (Source Normalised Impact per Paper): 2014 = 0.897; WoS Impact Factor: 2011 = 1.557 (2) - 2011=1.495 (5)
Citation count*16 (2020-03-16)
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