Characterization of ion/electron beam induced deposition of electrical contacts at the sub-μm scale

D Brunel , D. Troadec , D. Hourlier , D. Deresmes , Mariusz Zdrojek , T. Mélin

Abstract

We investigate the fabrication of electrical contacts using ion- and electron-beam induced deposition of platinum at the sub-μm scale. Halos associated with the metal surface decoration are characterized electrically in the 0.05–2 μm range using transport measurements, conducting atomic force microscopy and Kelvin probe microscopy. In contrast with IBID, EBID electrodes are shown to exhibit a low leakage resistance (above 1 MΩ) at the sub-100 nm scale, and are thus suitable to achieve resist-free electrical contacts for transport measurements on nanostructures. Four-point transport data using μm-spaced EBID contacts are provided for a multiwalled carbon nanotube.
Author D Brunel
D Brunel,,
-
, D. Troadec
D. Troadec,,
-
, D. Hourlier
D. Hourlier,,
-
, D. Deresmes
D. Deresmes,,
-
, Mariusz Zdrojek ZBS
Mariusz Zdrojek,,
- Structural Research Division
, T. Mélin
T. Mélin,,
-
Journal seriesMicroelectronic Engineering, ISSN 0167-9317
Issue year2011
Vol88
No7
Pages1569-1572
Keywords in Englishcarbon nanotube, Electron beam induced deposition, FIB, Four probe measurements, Ion beam induced deposition, Transport measurements
DOIDOI:10.1016/j.mee.2011.03.011
URL http://www.sciencedirect.com/science/article/pii/S0167931711002693
Score (nominal)25
Publication indicators WoS Impact Factor [Impact Factor WoS]: 2011 = 1.557 (2) - 2011=1.495 (5)
Citation count*4 (2015-06-01)
Cite
Share Share

Get link to the record
msginfo.png


* presented citation count is obtained through Internet information analysis and it is close to the number calculated by the Publish or Perish system.
Back