Combined Plasma-Based Fiber Etching and Diamond-Like Carbon Nanooverlay Deposition for Enhancing Sensitivity of Long-Period Gratings
Mateusz Jakub Śmietana , Marcin Koba , Predrag Mikulic , Wojtek J. Bock
AbstractThis paper presents an application of reactive ion etching followed by diamond-like carbon nanooverlay deposition using radio frequency plasma-enhanced chemical vapor deposition method for effective tuning of the refractive index (RI) sensitivity of long-period gratings (LPGs). Both etching and deposition take place within one process. Combination of both plasma-based processes allows for well-controlled tuning of the LPG sensorial response up to its operation at both dispersion turning point of higher order cladding modes and mode transition regime. As a result of the processing, the RI sensitivity has been enhanced up to over 12 000 nm/RIU per single resonance in narrow RI range (1.3344–1.3355 RIU) and over 2000 nm/RIU in broader RI range (1.34–1.356 RIU). Experimental results have been supported by numerical analyses that show capabilities for further significant improvement of both RI sensitivity and range of RI measured with the enhanced sensitivity.
|Journal series||Journal of Lightwave Technology, ISSN 0733-8724|
|Pages||4615 - 4619|
|Publication size in sheets||0.5|
|Keywords in English||Chemical vapor deposition, diamond-like carbon, long-period gratings, optical fiber sensors, plasma-based processing, reactive ion etching, refractive index sensing, thin films.|
|Project||The Development of Design, Processing and Testing Methods of the Electronic Devices and Materials for Microelectronics and Optoelectronics. Project leader: Szczepański Paweł,
, Phone: (48 22) 234 58 70, start date 01-01-2015, planned end date 31-12-2015, end date 31-05-2016, IMiO/2015/STATUT/1, Implemented
|Score|| = 35.0, 23-04-2020, ArticleFromJournal|
= 35.0, 23-04-2020, ArticleFromJournal
|Publication indicators||= 18; = 17; = 24.0; : 2016 = 1.804; : 2016 = 3.671 (2) - 2016=3.35 (5)|
|Citation count*||26 (2020-08-18)|
* presented citation count is obtained through Internet information analysis and it is close to the number calculated by the Publish or Perish system.