PE CVD of SiO2 thin films at atmospheric pressure by discharges stabilized with a dielectric barrier

Krzysztof Schmidt-Szałowski , Wojciech Fabianowski , Zenobia Rżanek-Boroch , J. Sentek


Author Krzysztof Schmidt-Szałowski ZTNC
Krzysztof Schmidt-Szałowski,,
- Inorganic Technology and Ceramics Department
, Wojciech Fabianowski KChTP
Wojciech Fabianowski,,
- Chair Of Polymer Chemistry And Technology
, Zenobia Rżanek-Boroch KTCh
Zenobia Rżanek-Boroch,,
- Chair of Chemical Technology
, J. Sentek
J. Sentek,,
Journal seriesJournal of Wide Bandgap Materials
Issue year1998
Internal identifier299
Languageen angielski
Score (nominal)0
Citation count*11 (2015-05-23)
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* presented citation count is obtained through Internet information analysis and it is close to the number calculated by the Publish or Perish system.