PE CVD of SiO2 thin films at atmospheric pressure by discharges stabilized with a dielectric barrier
Krzysztof Schmidt-Szałowski , Wojciech Fabianowski , Zenobia Rżanek-Boroch , J. Sentek
|Journal series||Journal of Wide Bandgap Materials|
|Citation count*||11 (2015-05-23)|
* presented citation count is obtained through Internet information analysis and it is close to the number calculated by the Publish or Perish system.