Influence of generation control of the magnetron plasma on structure and properties of copper nitride layers
Katarzyna Nowakowska-Langier , Łukasz Skowroński , Rafał Chodun , Sebastian Okrasa , Grzegorz Strzelecki , Magdalena Wilczopolska , Bartosz Wicher , Robert Mirowski , Krzysztof Zdunek
This paper describes one of the series of works that aimed to investigate the impact of modulation frequency. This parameter is specific to plasma excitation and is associated with the properties of the thin films of copper nitride synthesized by magnetron sputtering. The studies reported in this paper focus on the changes in chemical and phase compositions of the Cu-N layers with respect to their electronic properties. The measurements obtained allowed studying the phenomena that occur during the synthesis of the metastable copper nitride. The results revealed that the synthesis processes are very sensitive to changes in sputtering parameters. It was also found that the modulation of sputtering frequency and the power influence the structure and consequently the properties of the synthesized layers.
|Journal series||Thin Solid Films, ISSN 0040-6090|
|Publication size in sheets||0.5|
|Keywords in English||Metastable material; Copper nitride layer; Pulsed magnetron sputtering; Frequency modulation; Electronic properties|
|ASJC Classification||; ; ; ;|
|Score||= 70.0, 22-07-2020, ArticleFromJournal|
|Publication indicators||= 0; : 2017 = 0.864; : 2018 = 1.888 (2) - 2018=1.748 (5)|
* presented citation count is obtained through Internet information analysis and it is close to the number calculated by the Publish or Perish system.