Influence of generation control of the magnetron plasma on structure and properties of copper nitride layers

Katarzyna Nowakowska-Langier , Łukasz Skowroński , Rafał Chodun , Sebastian Okrasa , Grzegorz Strzelecki , Magdalena Wilczopolska , Bartosz Wicher , Robert Mirowski , Krzysztof Zdunek

Abstract

This paper describes one of the series of works that aimed to investigate the impact of modulation frequency. This parameter is specific to plasma excitation and is associated with the properties of the thin films of copper nitride synthesized by magnetron sputtering. The studies reported in this paper focus on the changes in chemical and phase compositions of the Cu-N layers with respect to their electronic properties. The measurements obtained allowed studying the phenomena that occur during the synthesis of the metastable copper nitride. The results revealed that the synthesis processes are very sensitive to changes in sputtering parameters. It was also found that the modulation of sputtering frequency and the power influence the structure and consequently the properties of the synthesized layers.

Author Katarzyna Nowakowska-Langier - National Center for Nuclear Research (NCBJ)
Katarzyna Nowakowska-Langier,,
-
, Łukasz Skowroński - Uniwersytet Technologiczno-Przyrodniczy im. Jana i Jędrzeja Śniadeckich w Bydgoszczy (UTP)
Łukasz Skowroński,,
-
, Rafał Chodun (FMSE / DSE)
Rafał Chodun,,
- Division of Surface Engineering
, Sebastian Okrasa (FMSE / DSE)
Sebastian Okrasa,,
- Division of Surface Engineering
, Grzegorz Strzelecki - National Center for Nuclear Research (NCBJ)
Grzegorz Strzelecki,,
-
, Magdalena Wilczopolska - National Center for Nuclear Research (NCBJ)
Magdalena Wilczopolska,,
-
, Bartosz Wicher (FMSE / DSE)
Bartosz Wicher,,
- Division of Surface Engineering
, Robert Mirowski - National Center for Nuclear Research (NCBJ)
Robert Mirowski,,
-
, Krzysztof Zdunek (FMSE / DSE)
Krzysztof Zdunek,,
- Division of Surface Engineering
Journal seriesThin Solid Films, ISSN 0040-6090
Issue year2020
Vol694
Pages1-7
Publication size in sheets0.5
Keywords in EnglishMetastable material; Copper nitride layer; Pulsed magnetron sputtering; Frequency modulation; Electronic properties
ASJC Classification2504 Electronic, Optical and Magnetic Materials; 2505 Materials Chemistry; 2506 Metals and Alloys; 2508 Surfaces, Coatings and Films; 3110 Surfaces and Interfaces
DOIDOI:10.1016/j.tsf.2019.137731
URL https://www.sciencedirect.com/science/article/pii/S0040609019307576
Languageen angielski
File
1-s2.0-S0040609019307576-main.pdf 1.93 MB
Score (nominal)70
Score sourcejournalList
ScoreMinisterial score = 70.0, 22-07-2020, ArticleFromJournal
Publication indicators Scopus Citations = 0; Scopus SNIP (Source Normalised Impact per Paper): 2017 = 0.864; WoS Impact Factor: 2018 = 1.888 (2) - 2018=1.748 (5)
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