Investigation of surface reactions in ArF photoresist by using parallel plate structure in conjunction with numerical analysis

Arkadiusz Malinowski , M Sekine , M Hori , K Ishikawa , H Kondo , T. Suzuki , H Yamamoto , T. Takeuchi , Andrzej Jakubowski , Lidia Łukasiak

Abstract

n/a
Author Arkadiusz Malinowski IMiO
Arkadiusz Malinowski,,
- The Institute of Microelectronics and Optoelectronics
, M Sekine
M Sekine,,
-
, M Hori
M Hori,,
-
, K Ishikawa
K Ishikawa,,
-
, H Kondo
H Kondo,,
-
, T. Suzuki
T. Suzuki,,
-
, H Yamamoto
H Yamamoto,,
-
, T. Takeuchi
T. Takeuchi,,
-
, Andrzej Jakubowski IMiO
Andrzej Jakubowski,,
- The Institute of Microelectronics and Optoelectronics
, Lidia Łukasiak IMiO
Lidia Łukasiak,,
- The Institute of Microelectronics and Optoelectronics
PagesP-37
Book Hori M: 4th International Conference on PLAsma-Nano Technology and Science, 2011
Languageen angielski
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