Improvement of immunity on MeV electron radiation of MOS structures by means of ultra-shallow fluorine implantation

Małgorzata Kalisz , Robert Paweł Mroczyński , Romuald Beck

Abstract

n/a
Author Małgorzata Kalisz - Instytut Transportu Samochodowego [Warsaw University of Technology (PW)]
Małgorzata Kalisz,,
-
- Politechnika Warszawska
, Robert Paweł Mroczyński (FEIT / MO)
Robert Paweł Mroczyński,,
- The Institute of Microelectronics and Optoelectronics
, Romuald Beck (FEIT / MO)
Romuald Beck,,
- The Institute of Microelectronics and Optoelectronics
Journal seriesMicroelectronics Reliability, (A 20 pkt)
Issue year2011
Vol51
No7
Pages1183-1186
ASJC Classification2208 Electrical and Electronic Engineering; 2508 Surfaces, Coatings and Films; 2213 Safety, Risk, Reliability and Quality; 3104 Condensed Matter Physics; 3107 Atomic and Molecular Physics, and Optics; 2504 Electronic, Optical and Magnetic Materials
DOIDOI:10.1016/j.microrel.2011.02.014
ProjectThe Development of Design, Processing and Testing Methods of the Electronic Devices and Materials for Microelectronics and Optoelectronics. Project leader: Szczepański Paweł, , Phone: (48 22) 234 58 70, application date 23-06-2010, start date 01-07-2010, planned end date 31-03-2011, end date 31-01-2012, IMiO/2010/STATUT/1, Completed
WEiTI Działalność statutowa
Languageen angielski
Score (nominal)20
Score sourcejournalList
Publication indicators Scopus Citations = 4; WoS Citations = 4; Scopus SNIP (Source Normalised Impact per Paper): 2014 = 1.432; WoS Impact Factor: 2011 = 1.167 (2) - 2011=1.212 (5)
Citation count*4 (2020-01-27)
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