Specific features of fluorination of silicon surface region by RIE in r.f. CF4 plasma – novel method of improving electrical properties of thin PECVD silicon dioxide films

Małgorzata Kalisz , Robert Paweł Mroczyński , Romuald Beck

Abstract

n/a
Author Małgorzata Kalisz - Instytut Transportu Samochodowego [Warsaw University of Technology (PW)]
Małgorzata Kalisz,,
-
- Politechnika Warszawska
, Robert Paweł Mroczyński (FEIT / MO)
Robert Paweł Mroczyński,,
- The Institute of Microelectronics and Optoelectronics
, Romuald Beck (FEIT / MO)
Romuald Beck,,
- The Institute of Microelectronics and Optoelectronics
Pages66-69
Book Colinge J.P., Balestra Francis, Deleonibus S., De Meyer K., Haond M., Ponomarev Y., Sangiorgi E.: Proceedings of 12th International Conference on Ultimate Integration on Silicon ULIS 2011, 2011, Tyndall National Institute, DOI:10.1109/ULIS.2011.5757946
DOIDOI:10.1109/ULIS.2011.5757960
Languageen angielski
Score (nominal)10
Publication indicators Scopus Citations = 1; WoS Citations = 4
Citation count*1 (2020-01-10)
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* presented citation count is obtained through Internet information analysis and it is close to the number calculated by the Publish or Perish system.
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